Epitaxy regions extending below STI regions and profiles thereof

ABSTRACT

A method includes forming isolation regions extending into a semiconductor substrate, forming a plurality of semiconductor fins protruding higher than top surfaces of the isolation regions, forming a gate stack on the plurality of semiconductor fins, forming a gate spacer on a sidewall of the gate stack, and recessing the plurality of semiconductor fins to form a plurality of recesses on a side of the gate stack. The plurality of recesses extend to a level lower than top surfaces of the isolation regions. Epitaxy processes are performed to grow an epitaxy region, wherein the epitaxy region fills the plurality of recesses.

PRIORITY CLAIM AND CROSS-REFERENCE

This application claims the benefit of the U.S. Provisional ApplicationNo. 63/065,192, filed Aug. 13, 2020, and entitled “STI confined Shape ofShielding Layer (L1) in EPI,” and Provisional Application No.63/078,960, filed Sep. 16, 2020, and entitled “STI confined Shape ofShielding Layer (L1) in EPI,” and is related to application Ser. No.17/124,017, filed Dec. 16, 2020, and entitled “Embedded Stressors inEpitaxy Source/drain Regions,” which applications are herebyincorporated herein by reference.

BACKGROUND

In the formation of Fin Field-Effect Transistors, source/drain regionswere typically formed by forming semiconductor fins, recessingsemiconductor fins to form recesses, and growing epitaxy regionsstarting from the recesses. The epitaxy regions grown from the recessesof neighboring semiconductor fins may merge with each other, and theresulting epitaxy regions may have planar top surfaces. The source/draincontact plugs are formed to electrically connect to the source/drainregions.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIGS. 1, 2, 3A, 3B, 3C, 4A, 4B, 4C, 5A, 5B, 6A, 6B, 7A, 7B, 8A, 8B, 8C,9A, 9B, 10A, 10B, 11A, 11B, and 11C illustrate the perspective views andcross-sectional views of intermediate stages in the formation of a FinField-Effect Transistor (FinFET) in accordance with some embodiments.

FIGS. 12 and 13 illustrate the cross-sectional views of intermediatestages in the formation of an n-type FinFET and a p-type FinFET inaccordance with some embodiments.

FIG. 14 illustrates the distribution of phosphorous and germanium in anepitaxy region of an n-type FinFET in accordance with some embodiments.

FIG. 15 illustrates the distribution of phosphorous, arsenic, andgermanium in an epitaxy region of an n-type FinFET in accordance withsome embodiments.

FIG. 16 illustrates a process flow for forming a FinFET in accordancewith some embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the invention. Specificexamples of components and arrangements are described below to simplifythe present disclosure. These are, of course, merely examples and arenot intended to be limiting. For example, the formation of a firstfeature over or on a second feature in the description that follows mayinclude embodiments in which the first and second features are formed indirect contact, and may also include embodiments in which additionalfeatures may be formed between the first and second features, such thatthe first and second features may not be in direct contact. In addition,the present disclosure may repeat reference numerals and/or letters inthe various examples. This repetition is for the purpose of simplicityand clarity and does not in itself dictate a relationship between thevarious embodiments and/or configurations discussed.

Further, spatially relative terms, such as “underlying,” “below,”“lower,” “overlying,” “upper” and the like, may be used herein for easeof description to describe one element or feature's relationship toanother element(s) or feature(s) as illustrated in the figures. Thespatially relative terms are intended to encompass differentorientations of the device in use or operation in addition to theorientation depicted in the figures. The apparatus may be otherwiseoriented (rotated 90 degrees or at other orientations) and the spatiallyrelative descriptors used herein may likewise be interpretedaccordingly.

A Fin Field-Effect Transistor (FinFET) and the method of forming thesame are provided. In accordance with some embodiments of the presentdisclosure, a source/drain region of a FinFET is formed to extend to alevel lower than the top surfaces of Shallow Trench Isolation (STI)regions that are on opposing sides of the source/drain region. The shortchannel effect is thus reduced. Embodiments discussed herein are toprovide examples to enable making or using the subject matter of thisdisclosure, and a person having ordinary skill in the art will readilyunderstand modifications that can be made while remaining withincontemplated scopes of different embodiments. Throughout the variousviews and illustrative embodiments, like reference numbers are used todesignate like elements. Although method embodiments may be discussed asbeing performed in a particular order, other method embodiments may beperformed in any logical order.

FIGS. 1, 2, 3A, 3B, 3C, 4A, 4B, 4C, 5A, 5B, 6A, 6B, 7A, 7B, 8A, 8B, 8C,9A, 9B, 10A, 10B, 11A, 11B, and 11C illustrate the perspective views andcross-sectional views of intermediate stages in the formation of aFinFET in accordance with some embodiments of the present disclosure.The corresponding processes are also reflected schematically in theprocess flow 200 shown in FIG. 16 .

FIG. 1 illustrates a perspective view of an initial structure. Theinitial structure includes wafer 10, which further includes substrate20. Substrate 20 may be a semiconductor substrate, which may be asilicon substrate, a silicon germanium substrate, or a substrate formedof other semiconductor materials. The top surface of substrate 20 may beon a (100) surface plane. Substrate 20 may be doped with a p-type or ann-type impurity. Isolation regions 22 such as Shallow Trench Isolation(STI) regions may be formed to extend from a top surface of substrate 20into substrate 20. The portions of substrate 20 between neighboring STIregions 22 are referred to as semiconductor strips 24. The top surfacesof semiconductor strips 24 and the top surfaces of STI regions 22 may besubstantially level with each other in accordance with some embodiments.

STI regions 22 may include a liner oxide (not shown), which may be athermal oxide formed through a thermal oxidation of a surface layer ofsubstrate 20. The liner oxide may also be a deposited silicon oxidelayer formed using, for example, Atomic Layer Deposition (ALD),High-Density Plasma Chemical Vapor Deposition (HDPCVD), or ChemicalVapor Deposition (CVD). STI regions 22 may also include a dielectricmaterial over the liner oxide, wherein the dielectric material may beformed using Flowable Chemical Vapor Deposition (FCVD), spin-on, or thelike.

In accordance with some embodiments, semiconductor strips 24 are formedof a same material as the underlying bulk portions of semiconductorsubstrate 24. For example, when an n-type FinFET is to be formed, thecorresponding semiconductor strips 24 may be a part of the originalsubstrate 20, and may comprise the same material (such as silicon) asthe underlying bulk portions of semiconductor substrate 24. When ap-type FinFET is to be formed, the corresponding semiconductor strips 24may be formed of silicon germanium (SiGe), germanium, or the like, andmay be different from the underlying bulk portions of semiconductorsubstrate 24, which may comprise silicon and free from germanium. Theformation of the corresponding structure may include optionallyrecessing a portion of substrate 20 in a part of wafer 10 (such as inthe regions for forming p-type FinFETs), performing an epitaxy processto grow an epitaxy layer, which may be formed of or comprise SiGe orgermanium, on the recessed parts of the substrate, and then forming STIregions 22 extending into the epitaxy SiGe/Ge layer.

Referring to FIG. 2 , STI regions 22 are recessed, so that the topportions of semiconductor strips 24 protrude higher than the topsurfaces 22A of STI regions 22 to form protruding fins 24′. Therespective process is illustrated as process 202 in the process flow 200shown in FIG. 16 . The portions of semiconductor strips 24 in STIregions 22 are still referred to as semiconductor strips 24. The etchingmay be performed using a dry etching process, wherein a mixture of HFand NH₃ may be used as the etching gases. The etching may also beperformed using a mixture of NF₃ and NH₃ as the etching gases. Duringthe etching process, plasma may be generated. Argon may also beincluded. In accordance with alternative embodiments of the presentdisclosure, the recessing of STI regions 22 is performed using a wetetching process. The etching chemical may include HF solution, forexample.

In accordance with some embodiments, the fins for forming the FinFETsmay be formed/patterned by any suitable method. For example, the finsmay be patterned using one or more photolithography processes, includingdouble-patterning or multi-patterning processes. Generally,double-patterning or multi-patterning processes combine photolithographyand self-aligned processes, allowing patterns to be created that have,for example, pitches smaller than what is otherwise obtainable using asingle, direct photolithography process. For example, in one embodiment,a sacrificial layer is formed over a substrate and patterned using aphotolithography process. Spacers are formed alongside the patternedsacrificial layer using a self-aligned process. The sacrificial layer isthen removed, and the remaining spacers, or mandrels, may then be usedto pattern the fins.

Referring to FIGS. 3A, 3B, and 3C, dummy gate stacks 30 are formed onthe top surfaces and the sidewalls of protruding fins 24′. Therespective process is illustrated as process 204 in the process flow 200shown in FIG. 16 . In accordance with some embodiments, a fin group forforming a FinFET may include a plurality of fins tightly groupedtogether. For example, the example shown in FIG. 3B illustrates a 2-fingroup, and the example shown in FIG. 3C illustrates a 3-fin group. Thefins in the same fin group may have spacings smaller than the spacingsbetween neighboring fin groups.

The cross-sectional view shown in FIG. 3A is obtained from the verticalreference cross-section A-A in FIG. 3C, and the vertical cross-sectionalview shown in FIG. 3B is obtained from the vertical referencecross-section B-B in FIG. 3C. It is appreciated that although two dummygate stacks 30 are illustrated for clarity, there may be more dummy gatestacks formed, which are parallel to each other, with the plurality ofdummy gate stacks crossing the same semiconductor fin(s) 24′. Dummy gatestacks 30 may include dummy gate dielectrics 32 (FIG. 3A) and dummy gateelectrodes 34 over dummy gate dielectrics 32. Dummy gate electrodes 34may be formed using, for example, amorphous silicon or polysilicon, andother materials may also be used. Each of dummy gate stacks 30 may alsoinclude one (or a plurality of) hard mask layer 36 over dummy gateelectrode 34. Hard mask layers 36 may be formed of silicon nitride,silicon carbo-nitride, silicon oxy-carbo-nitride, or the like. Dummygate stacks 30 also have lengthwise directions perpendicular to thelengthwise directions of protruding fins 24′.

Next, gate spacers 38 (FIGS. 3A and 3C) are formed on the sidewalls ofdummy gate stacks 30. The respective process is illustrated as process206 in the process flow 200 shown in FIG. 16 . In accordance with someembodiments of the present disclosure, gate spacers 38 are formed ofdielectric materials such as silicon carbon-oxynitride (SiCN), siliconoxy-carbon-oxynitride (SiOCN), silicon nitride, or the like, and mayhave a single-layer structure or a multi-layer structure including aplurality of dielectric layers. In accordance with some embodiments,gate spacers 38 (and fin spacers 39 (FIGS. 3B and 4B) include a siliconnitride layer and a SiOCN layer on the silicon nitride layer.

FIG. 3B also illustrates fin spacers 39 formed on the sidewalls ofprotruding fins 24′. The respective process is also illustrated asprocess 206 in the process flow 200 shown in FIG. 16 . In accordancewith some embodiments of the present disclosure, fin spacers 39 areformed by the same processes for forming gate spacers 38. For example,in the process for forming gate spacers 38, the blanket dielectriclayer(s) that are deposited for forming gate spacers 38, when etched,may have some portions left on the sidewalls of protruding fins 24′,hence forming fin spacers 39. In accordance with some embodiments, thefin spacers 39 include outer fin spacers such as fin spacer 39A, whichis on the outer side of the outmost fin in the fin group. The finspacers 39 further include inner fin spacers such as fin spacer 39B,with the inner fin spacer being between the fins 24′ in the same fingroup. Fin spacer 39C may be an inner fin spacer or an outer fin spacer,depending on whether the fin spacer has another fin on the right side offin spacer 39C (and in the same fin group) or not. The illustrated finspacer 39C shows an inner spacer as an example.

In FIG. 3A and subsequent figures that illustrate cross-sectional views,the level of the top surfaces 22A of STI regions 22 (FIG. 3A) areillustrated, and semiconductor fin 24′ is higher than top surfaces 22A.Bottom surfaces 22B (FIG. 3A) of STI regions 22 are also illustrated inthe cross-sectional views. STI regions 22 are locate at the levelbetween 22A and 22B, and are not shown in FIG. 3A since they are indifferent planes than illustrated.

Referring to FIGS. 4A, 4B, and 4C, an etching process (also referred toas a source/drain recessing process hereinafter) is performed to recessthe portions of protruding fins 24′ that are not covered by dummy gatestacks 30 and gate spacers 38. Recesses 40 are thus formed. Therespective process is illustrated as process 208 in the process flow 200shown in FIG. 16 . FIGS. 4A and 4B illustrate the cross-sectional viewsobtained from reference cross-sections A-A and B-B, respectively, inFIG. 4C. The recessing may be anisotropic, and hence the portions offins 24′ directly underlying dummy gate stacks 30 and gate spacers 38are protected, and are not etched. The top surfaces of the recessedsemiconductor fins 24′ may be higher than the top surfaces 22A of STIregions 22 in accordance with some embodiments. Recesses 40 are alsolocated on opposite sides of dummy gate stacks 30, as shown in FIG. 3C.

In accordance with some embodiments, during the etching of protrudingfins 24′, fin spacers 39 are also etched, so that the heights of theouter spacer 39A and inner spacer 39B are reduced. Fin spacers 39 thushave heights H1 and H2 (FIG. 4B) as shown in FIG. 3B. Heights H1 and H2may be equal to or different from each other. The etching of fin spacers39 may be performed at the same time fins 24′ are recessed, with anetching gas(es) for etching fin spacers 39 added into the etching gasfor recessing protruding fins 24′. The etching of fin spacers 39 mayalso be performed after fins 24′ are recessed to adjust the heights offin spacers 39, with an etching gas attacking fin spacers 39 (but doesnot etch protruding fins 24′) being used. The adjustment of the heightsof the fin spacers 39 may be performed through an anisotropic etchingprocess.

In accordance with some embodiments of the present disclosure, therecessing of protruding fins 24′ is performed through a dry etchingprocess. The dry etching may be performed using process gases such asC₂F₆, CF₄, SO₂, the mixture of HF and ozone (followed by diluted HF),the mixture of HBr, Cl₂, and O₂, the mixture of HBr, Cl₂, O₂, and CF₂etc., or the like. The etching may be anisotropic. In accordance withsome embodiments of the present disclosure, as shown in FIG. 4A, thesidewalls of protruding fins 24′ facing recess 40 are substantiallyvertical, and are substantially flush with the outer sidewalls of gatespacers 38. The sidewalls of protruding fins 24′ facing recess 40 may beon (110) surface planes of semiconductor substrate 20. Referring to FIG.4B, the location of recesses 40, which are also the removed portions ofprotruding fins 24′, are shown. In FIG. 4B, dash lines are also drawn torepresent protruding fins 24′ that are directly underlying dummy gatestacks 30 (FIG. 4C), which are in a plane different than the illustratedplane.

In accordance with some embodiments, the bottoms of recesses 40 arelower than the top surfaces 22A of STI regions 22. As, shown in FIG. 4A,the depths D1 of the portions of recesses 40 lower than top surfaces 22Amay be in the range between about 5 percent and about 15 percent heightH4 of protruding fins 24′. In accordance with some embodiments, depth D1is in the range between about 0.5 nm and about 20 nm.

FIGS. 5A, 5B, 6A, 6B, 7A, 7B, 8A, and 8B illustrate the processes fordepositing epitaxy region(s) 42. In these figures and subsequentfigures, figure numbers may be followed by a letter A or B, whereinletter A indicates that the corresponding cross-sectional view isobtained from a reference plane same as the reference plane A-A in FIG.4C, and letter B indicates that the corresponding cross-sectional viewis obtained from a plane same as the reference plane B-B in FIG. 4C. Inthe subsequent discussion, the dopants and the corresponding dopantconcentrations of an n-type FinFET are discussed as an example. Thedopants and the corresponding dopant concentrations of a p-type FinFETare discussed in the discussion of FIG. 12 .

Referring to FIGS. 5A and 5B, a first epitaxy layer 42A (which is alsoreferred to as epitaxy layer L1) of an epitaxy region is depositedthrough an epitaxy process. The respective process is illustrated asprocess 210 in the process flow 200 shown in FIG. 16 . In accordancewith some embodiments, the deposition is performed through anon-conformal deposition process, so that the bottom portion of firstlayer 42A is thicker than the sidewall portions. This is incurred byallowing the growth on the (100) surface of semiconductor substrate 20to be faster than on the (110) surface. For example, the ratio of thebottom thickness TB1 to the sidewall thickness TS1 may be in the rangebetween about 1.5 and about 4. The deposition may be performed usingReduced pressure Chemical Vapor Deposition (RPCVD), Plasma EnhancedChemical Vapor Deposition (PECVD), or the like. In accordance with someembodiments, epitaxy layer 42A is formed of or comprises SiAs. Inaccordance with alternative embodiments, epitaxy layer 42A is formed ofor comprises SiP. In accordance with yet alternative embodiments,epitaxy layer 42A is formed of or comprises a SiAs layer and a SiP layerover the SiAs layer. The process gas for depositing epitaxy layer 42Amay include a silicon-containing gas such as silane, disilane (Si₂H₆),dicholorosilane (DCS), or the like, and a dopant-containing process gassuch as PH₃, AsH₃, or the like, depending on the desirable compositionof epitaxy layer 42A. The chamber pressure may be in the range betweenabout 100 Torr and about 300 Torr. Epitaxy layer 42A may have a firstdoping concentration (such as P) in the range between about 1×10²⁰/cm³and about 8×10²⁰/cm³. Epitaxy layer 42A may also have a first dopingconcentration (As) in the range between about 1×10²⁰/cm³ and about1×10²¹/cm³ when As is incorporated.

An etching gas such as HCl is added into the process gases to achieveselective deposition on semiconductor, but not on dielectric. Carriergas(es) such as H₂ and/or N₂ may also be included in the process gas,for example, with a flow rate in the range between about 50 sccm andabout 500 sccm. In accordance with some embodiments, a top surface T42Aof a portion of the first epitaxy layer 42A in the middle between twoneighboring gate stacks 30, which top surface T42A may be the lowestpoint in the illustrated cross-section, may be lower than, level with,or higher than, the top surfaces 22A of STI regions 22. Correspondingly,in FIG. 5B, top surface T42A may be at any level between level 1 andlevel 2, wherein level 1 is the level of the top ends of fin spacers 39,and level 2 is the top surface level of STI regions 22.

After the epitaxy process for depositing epitaxy layer 42A, an etching(back) process is performed. The respective process is illustrated asprocess 212 in the process flow 200 shown in FIG. 16 . In accordancewith some embodiments of the present disclosure, the etching-back isisotropic. The etching process may be performed using an etching gassuch as HCl and a carrier gas(es) such as H₂ and/or N₂. The precedingdeposition process and the subsequent etching back are optimized so thatepitaxy layer 42A has a desirable thickness. For example, after theetching process, bottom thickness TB1 of epitaxy layer 42A may be in therange between about 5 nm and about 20 nm, and sidewall thickness TS1(FIG. 5A) may be in the range between about 4 nm and about 10 nm. Thedeposition time and the etching time may be adjusted accordingly, forexample, with the deposition process lasts for about 20 seconds andabout 60 seconds, and the etching process lasts for about 5 seconds andabout 20 seconds.

As a result of the etching process, as shown in FIG. 5A, facets 42A-Fmay be formed, and the facets 42A-F extend to the top corners 24′TC ofprotruding fins 24′. In accordance with some embodiments, facets 42A-Fare on the (111) planes of epitaxy layer 42A. In accordance with otherembodiments, facets 42A-F are steeper (more vertical) than the (111)planes of substrate 20.

FIG. 5B illustrates a cross-sectional view, wherein the bottom portionsof epitaxy layers 42A are illustrated. The cross-sectional view shown inFIG. 5B is also obtained from the reference cross-section 5B-5B shown inFIG. 5A. In accordance with some embodiments, for example, when thecorresponding FinFET is an n-type FinFET, the top surface of the bottomportion of epitaxy layer 42A is level with or lower than the top end ofouter fin spacer 39A, and lower than the top ends of inner fin spacer39B. In accordance with alternative embodiments, for example, when thecorresponding FinFET is a p-type FinFET, the top surface of epitaxylayer 42A are higher than the top ends of outer fin spacer 39A and 39B.The corresponding structure is shown on the right side of FIGS. 12 and13 as an example.

In subsequent FIGS. 6A, 6B, 7A, and 7B, two epitaxy layers 42B1 and 42B2are formed, which have different atomic percentages of elements. Inaccordance with alternative embodiments, instead of forming two epitaxylayers, a single epitaxy layer 42B with uniform atomic percentages ofelements is formed. Accordingly, instead of performing an etching backprocess for each of epitaxy layers 42B1 and 42B2, a single etching backprocess is performed after the epitaxy of epitaxy layer 42B.

Referring to FIGS. 6A and 6B, a second epitaxy layer 42B1 (which is alsoreferred to as epitaxy layer L21) is deposited. The respective processis illustrated as process 214 in the process flow 200 shown in FIG. 16 .The deposition process may be performed using RPCVD, PECVD, or the like.An n-type dopant is added into epitaxy layer 42B1 when the correspondingFinFET is of n-type. In the discussion of epitaxy layers 42B1, 42B2, and42C (FIG. 8A), phosphorous is discussed as an example of the n-typedopants, while other n-type dopants such as arsenic, antimony, or thelike, or combinations thereof, may be used. In accordance with someembodiments, epitaxy layer 42B1 includes silicon phosphorous, with thephosphorous having a second phosphorous concentration higher than thefirst phosphorous concentration in epitaxy layers 42A. For example, thesecond phosphorous concentration in epitaxy layers 42B1 may be in therange between about 8×10²⁰/cm³ and about 5×10²¹/cm³ in accordance withsome embodiments. The second phosphorus concentration may be about oneorder or two orders higher than the first phosphorus concentration inepitaxy layers 42A. The process gas for forming epitaxy layer 42B1 maybe similar to the process gases in the formation of epitaxy layer 42A,except the flow rates of the process gases may be different from theflow rates of the corresponding process gases in the formation ofepitaxy layer 42A.

After the epitaxy to deposit epitaxy layer 42B1, an etching (back)process is performed. The respective process is illustrated as process216 in the process flow 200 shown in FIG. 16 . In accordance with someembodiments of the present disclosure, the etching process is isotropic.In accordance with some embodiments, the etching process is performedusing an etching gas such as HCl, and a carrier gas(es) such as H₂and/or N₂. In addition, a silicon-containing gas such as silane may beadded in the etching gas. The addition of the silicon-containing gasresults in a deposition effect, which occurs concurrently as the etchingeffect. The etching rate, however, is greater than the deposition rate,so that the net effect is the etching-back of epitaxy layer 42B1. Theaddition of the silicon-containing gas reduces the net etching rate, sothat when the surface profile of epitaxy layer 42B1 is re-shaped, thethickness of epitaxy layer 42B1 is not reduced significantly. Thedeposition and the etching are optimized so that epitaxy layer 42B1 hasa desirable thickness. As shown in FIG. 6A, the top surface of epitaxylayer 42B1 is re-shaped as having a V-shape by the etching process.

Referring to FIG. 6A again, the left top end of epitaxy layer 42B1 joinsto the left top end of epitaxy layer 42A, with both top ends joining tothe top end 24′TC of protruding fin 24′ on their left side. Accordingly,the topmost points of epitaxy layer 42B1 and epitaxy layer 42A are levelwith the top surface of protruding fin 24′. Similarly, the right top endof epitaxy layer joins to the right top end of epitaxy layer 42A, withboth top ends joining to the top end 24′TC of protruding fin 24′ ontheir right side. Facets 42B1-F may be formed as a result of etchingepitaxy layer 42B1. In accordance with some embodiments, facets 42A-Fare on the (111) planes of the epitaxy material. In accordance withalternative embodiments, facets 42B1-F are on the (111) planes of theepitaxy material.

Referring to FIG. 6B, the epitaxy layer 42B1 grown from neighboringrecesses are merged, with air gap 44 being sealed under epitaxy layer42B1. The top surface of the merged epitaxy layer 42B1 may have anon-planar profile (also referred to as having a wavy shape), with themiddle portion between neighboring fins being lower than the portions onits opposite sides. Also, as shown in both of FIGS. 6A and 6B, the topends of the top surfaces of epitaxy layer 42B1 are controlled to beleveled with the top surface of protruding fins 24′.

FIGS. 7A and 7B illustrate the epitaxy process for depositing a thirdepitaxy layer 42B2 (which is also referred to as epitaxy layer L22, withL21 and L22 collectively referred to as layer L2). The respectiveprocess is illustrated as process 218 in the process flow 200 shown inFIG. 16 . As shown in FIG. 7B, the top surface of epitaxy layer 42B2 hasthe wavy shape. The deposition process may be performed using RPCVD,PECVD, or the like. In accordance with some embodiments, epitaxy layer42B2 includes silicon phosphorous, with the phosphorous having a thirdphosphorous concentration higher than the second phosphorousconcentration in epitaxy layers 42B1. Furthermore, epitaxy layer 42B2has the highest phosphorous concentration in the resulting source/drainregion. For example, the third phosphorous concentration in epitaxylayers 42B2 may be in the range between about 2×10²¹/cm³ and about5×10²¹/cm³ in accordance with some embodiments. The ratio of the thirdphosphorus concentration to the second phosphorus concentration ofepitaxy layer 42B1 may be in the range between about 3 and about 6. Theprocess gases for forming epitaxy layer 42B2 may be similar to theprocess gases in the formation of epitaxy layer 42B1, except the flowrates are adjusted to achieve the desirable concentrations.

After the epitaxy process for depositing epitaxy layer 42B2, an etchingprocess is performed. The respective process is illustrated as process220 in the process flow 200 shown in FIG. 16 . In accordance with someembodiments of the present disclosure, the etching is isotropic. Inaccordance with some embodiments, the etching process is performed usingan etching gas such as HCl and a carrier gas(es) such as H₂ and/or N₂.In addition, a silicon-containing gas such as silane may be added intothe etching gas to deposit silicon. The etching process thus includesboth of an etching effect and a deposition effect, with the net effectbeing etching. The addition of the silicon-containing gas reduces theetching rate, so that when the surface profile of epitaxy layer 42B2 isre-shaped, the thickness of epitaxy layer 42B2 is not reducedsignificantly.

With the topmost ends of epitaxy layer 42B1 being in contact with thetop corners 24′TC of protruding fins 24′, the top portions of epitaxylayer 42B2, which are over epitaxy layer 42B1, are higher than the topsurfaces of protruding fins 24′. The sidewalls 42B2-SW (FIG. 7A) of thetop portions of epitaxy layer 42B2 are thus in contact with thesidewalls of gate spacers 38. The sidewalls 42B2-SW are on the (110)surface planes of the semiconductor material of epitaxy layer 42B2.

Since the material and the lattice structure of epitaxy layer 42B2 aredifferent from the material and the structure of gate spacers 38, astress is generated and applied by gate spacers 38 on the resultingepitaxy layers. Epitaxy layer 42B2 is an embedded stressor embedded inthe resulting source/drain region. The internal stress in epitaxy layer42B2 is a tensile stress. As shown in FIG. 6A, at least a part of thestress is contributed by gate spacers 38, and the stress is increaseddue to that epitaxy layer 42B2 has a high doping concentration (ofphosphorus, for example). The lower part of epitaxy layer 42B2 is lowerthan the top surfaces of protruding fins 24′, and hence the stress ispassed from the top portion of epitaxy layer 42B2, which top portion ishigher than the top surfaces of protruding fins 24′, to the lower/bottomportion of epitaxy layer 42B2, which lower/bottom portion is lower thanthe top surfaces of protruding fins 24′. Furthermore, both of the topsurface and the bottom surface of epitaxy layer 42B2 may have theV-shapes, which may improve the efficiency in transferring stress fromtop portion to the bottom portion of epitaxy layer 42B2. Accordingly,the stress is also applied to the channel of the resulting FinFET, andhence improves the performance of the resulting FinFET. In addition, theinternal stress in the resulting FinFET also results in the increase inthe activation rate of the dopant (phosphorous, for example). Tomaximize the stress, the height H3 of sidewalls 42B2-SW is in a selectedrange. For example, height H3 is great enough to induce a high stress.On the other hand, a too-high height H3 results in the saturation of thestress, and may cause less stress to be passed to the lower portion ofepitaxy layer 42B2. In accordance with some embodiments, height H3 is inthe range between about 3 nm and about 15 nm.

Furthermore, the depth D2 (FIG. 7A) of epitaxy layer 42B2, which is thedepth of epitaxy layer 42B2 below the top surfaces of protruding fins24′, is also in a selected range to maximize the stress received fromthe top part of epitaxy layer 42B2, and to maximize the effect of thestress. For example, depth D2 may be in the range between about 3 nm andabout 15 nm. Furthermore, a ratio D2/H4 may be in the range betweenabout 0.3 and about 0.5, wherein height H4 is the height of protrudingfins 24′.

FIGS. 8A and 8B illustrate the epitaxy process for depositing a fourthepitaxy layer 42C (which is also referred to as epitaxy layer L3 or acapping layer). The respective process is illustrated as process 222 inthe process flow 200 shown in FIG. 16 . The deposition process may beperformed using RPCVD, PECVD, or the like. The top surface of epitaxylayer 42C (FIG. 8B) maintains the wavy shape. In accordance with someembodiments, epitaxy layer 42C includes silicon phosphorous, with thephosphorous having a fourth phosphorous concentration lower than thephosphorous concentrations in epitaxy layers 42B2. In addition,germanium may be incorporated, for example, with a germanium atomicpercentage in the range between about 1 percent and about 5 percent. Inaccordance with some embodiments, the phosphorous concentration inepitaxy layers 42C may be in the range between about 1×10²⁰/cm³ andabout 3×10²¹/cm³. The process gases for forming epitaxy layer 42C may besimilar to the process gases in the formation of epitaxy layer 42B2,except a germanium-containing gas such as germane (GeH₄), digermane(Ge₂H₆), or the like may be added. Throughout the description, epitaxylayers 42A, 42B1, 42B2, and 42C are collectively and individuallyreferred to as epitaxy layers 42, which are collectively referred to assource/drain regions 42 hereinafter. Source/drain regions 42 are alsoshown in FIG. 8C.

Referring to FIG. 8B, in accordance with some embodiments, wavy heightWH may be in the range between about 5 nm and about 15 nm, wherein wavyheight WH is measured from the topmost point of the top surface ofepitaxy layer 42C to the lowest point of the top surface of epitaxylayer 42C, with the lowest point being in the middle between twoneighboring fins. Merge height MH may be in the range between about 15nm and about 35 nm. Outer width OW may be in the range between about 10nm and about 20 nm. Inner spacing IS may be in the range between about30 nm and about 45 nm. Raise height RH may be in the range between about1 nm and about 10 nm. Height H1 of outer fin spacers 39A may be in therange between about 5 nm and about 15 nm. Height H2 of inner fin spacers39B may be in the range between about 10 nm and about 30 nm. Ratio H2/H1may be in the range between about 1 and about 3.

Referring to FIGS. 9A and 9B, Contact etch stop layer (CESL) 46 andInter-Layer Dielectric (ILD) 48 are formed over epitaxy regions 42, andon the sides of dummy gate stacks 30 (FIG. 8C). The respective processis illustrated as process 224 in the process flow 200 shown in FIG. 16 .A planarization process such as a Chemical Mechanical Polish (CMP)process or a mechanical grinding process is performed to remove excessportions of CESL 46 and ILD 48, until dummy gate stacks 30 (FIG. 8A) areexposed. The dummy gate stacks 30 are replaced with replacement gatestacks 56 as shown in FIG. 9B. The processes for forming the replacementgate stacks are not shown. The resulting replacement gate stacks 56,however, are shown in FIG. 9A. Replacement gate stacks 56 include gatedielectrics, which further include interfacial layers 50 on the topsurfaces and sidewalls of protruding fins 24′, and high-k dielectrics 52on the interfacial layers. Replacement gate stacks 56 further includegate electrodes 54 over high-k dielectrics 52. After the formation ofreplacement gate stacks 56, replacement gate stacks 56 are recessed toform trenches between gate spacers 38. A dielectric material such assilicon nitride, silicon oxynitride, or the like, is filled into theresulting trenches to form hard masks 58.

Next, as shown in FIGS. 10A and 10B, ILD 48 and CESL 46 are etched toform contact opening 60. Opening 60 penetrates through epitaxy layer42C, so that epitaxy layer 42B2 is exposed. The respective process isillustrated as process 226 in the process flow 200 shown in FIG. 16 . Asshown in both of FIGS. 10A and 10B, epitaxy layer 42C is etched-through,and the top surface of epitaxy layer 42B2 is exposed. The adding ofgermanium in epitaxy layer 42C results in the etching rate of epitaxylayer 42C to be significantly greater than the etching rate of epitaxylayer 42B2, and hence by controlling the etching process, the etchingmay be substantially stopped on epitaxy layer 42B2, with theover-etching of epitaxy layer 42B2 being small. As shown in FIG. 10A,the exposed top surface of epitaxy layer 42B2 is wavy, with the middleportion being recessed relative to the opposing portions on the oppositesides of the middle portion, so that the middle portion has a V-shape inthe cross-sectional view.

Next, as shown in FIGS. 11A, 11B, and 11C, source/drain silicide region64 and source/drain contact plug 66 are formed. FIG. 11A illustrates thecross-sectional view in the vertical reference cross-section A-A in FIG.11C. FIG. 11B illustrates the cross-sectional view in the verticalreference cross-section B1-B1 in FIG. 11C (except FIG. 11B shows twofins, while FIG. 11C shows three fins). In accordance with someembodiments of the present disclosure, the formation of the source/drainsilicide region 64 includes depositing a metal layer such as a titaniumlayer, a cobalt layer, or the like, extending into opening 60 (FIGS. 10Aand 10B), and then performing an annealing process so that the bottomportion of the metal layer reacts with epitaxy layer 42B2 to form asilicide region. The respective process is illustrated as process 228 inthe process flow 200 shown in FIG. 16 . The remaining un-reacted metallayer may be removed. Source/drain contact plug 66 is then formed intrench 60, and is electrically connected to the respective source/drainsilicide region 64. The respective process is illustrated as process 230in the process flow 200 shown in FIG. 16 . FinFET 68 is thus formed.

The embodiments of the present disclosure may be implemented in both ofn-type FinFET and p-type FinFETs. For example, FIG. 12 illustrates anintermediate stage, in which n-type FinFET 68N and p-type FinFET 68P areboth formed on the same substrate 20. The corresponding layers inepitaxy regions are inserted with letter “N” or “P” following referencenumeral “42” to indicate the source/drain region 42N of the n-typeFinFET 68N is of n-type, and the source/drain region 42P of the p-typeFinFET 68P is of P-type. The details of epitaxy layers 42NA, 42NB, and42NC may be found referring to the disclosure referring to precedingfigures (with 42NB possibly including 42B1 and 42B2), and are notrepeated herein. Both of epitaxy regions 42N and 42P extend to levelsbelow the top surfaces 22A of STI regions 22.

In accordance with some embodiments, as illustrated in FIG. 12 , for theN-type source/drain region 42N, the top surface of epitaxy layers 42NBand 42NC is wavy. On the other hand, for the p-type source/drain region42P, the top surface of epitaxy layer 42PB is wavy, while the topsurface of epitaxy layer 42PC has a cone shape, with the middle portionbetween two neighboring fins being the highest. Experiments haverevealed that the fins of p-type FinFETs have severe bending problem ifthe source/drain regions 42P of the p-type FinFET have wavy top surface.By forming the p-type source/drain regions as having cone-shapes, thefin bending in the fins of the p-type FinFET is reduced. On the otherhand, fin bending is not an issue for n-type FinFETs, so source/drainregion 42N may be formed as having wavy shapes. The cone-shape of thep-type source/drain region 42P may be achieved, for example, byincreasing the thickness of epitaxy layers 42P and the correspondingraising height RHP, adjusting the process conditions to increase theheight H2 of inner fin spacers 39B to be significantly greater than theheight H1, or the like. In accordance with some embodiments, epitaxylayers 42PA, 42PB, and 42PC may be formed of SiB, SiGeB, or the like.The epitaxy layers 42PA grown from neighboring recesses may be separatedfrom each other, or may be merged, as represented by dashed lines 43,which shows the merged portion. The processes for forming the p-typeFinFET are also the same as the process shown in preceding figures,except the materials of epitaxy layers 42PA, 42PB, and 42PC aredifferent from the epitaxy region of n-type FinFET 68N. In accordancewith some embodiments, the boron concentration in epitaxy layer 42PA maybe in the range from about 1E20/cm³ and about 6E20/cm³. The boronconcentration in epitaxy layer 42PB may be is in the range from about6E20/cm³ and about 3E21/cm³. The boron concentration in epitaxy layer42PC may be is in the range from about 1E21/cm³ and about 8E21/cm³. Thegermanium atomic percentage range in epitaxy layer 42PA may be in therange from about 15% and about 40%. The germanium atomic percentagerange in epitaxy layer 42PB may be in the range from about 40% and about60%. The germanium atomic percentage range in epitaxy layer 42PC may bein the range from about 45% and about 55%. The protruding fins of thep-type FinFETs, which protruding fins are under the correspondingreplacement gate stacks, may be formed of silicon germanium orgermanium.

FIG. 13 illustrates the structure after the formation of source/drainsilicide regions 64N and 64P and source/drain contact plugs 66N and 66Pare formed. In accordance with some embodiments, source/drain silicideregion 64P and source/drain contact plug 66P penetrate through epitaxylayer 42PC and stop on epitaxy layer 42PB. The interface of source/drainsilicide region 64P and epitaxy layer 42PB is also wavy, hence thecontact area is increased.

It is appreciated that the cross-sectional views shown in FIGS. 12 and13 may both be found in the final FinFETs 68N and 68P. For example, thecross-sectional view shown in FIG. 12 may be obtained from the referencecross-section B2-B2 in FIG. 11C, and from the corresponding n-typeFinFET and p-type FinFET. The cross-sectional view shown in FIG. 13 maybe obtained from the reference cross-section B1-B1 in FIG. 11C, and fromthe corresponding n-type FinFET and p-type FinFET.

FIG. 14 illustrates the distribution profiles of phosphorus (the leftY-axis) and germanium (the right Y-axis) in epitaxy layers 42C, 42B2,42B1, and 42A of an n-type FinFET in accordance with some embodiments.The corresponding epitaxy layer 42A is a single SiP layer in theillustrated example. The left Y-axis shows the phosphorousconcentration, which is represented by line 70. The right Y-axis showsthe germanium atomic percentage, which is represented by line 72.

FIG. 15 illustrates the distribution profiles of phosphorus and arsenic(the left Y-axis) and germanium (the right Y-axis) in layers 42C, 42B2,42B1, and 42A of an n-type FinFET in accordance with some embodiments.The corresponding epitaxy layer 42A includes a SiAs layer and a SiPlayer on the SiAs layer. The left Y-axis shows the phosphorousconcentration, which is represented by line 74, and the arsenicconcentration, which is represented by line 78. The right Y-axis showsthe germanium atomic percentages of Ge, wherein the atomic concentrationof Ge is represented by line 76.

The embodiments of the present disclosure have some advantageousfeatures. By recessing protruding fins and further recessing thesemiconductor strips underlying the protruding fins, so that therecesses extend to a level below the top surfaces of STI regions, it iseasy to control the dopant of the bottom portion (L1) of thesource/drain regions. Accordingly, there is better control of dopantdiffusion into the channel. Short channel effect is thus prevented.

In accordance with some embodiments of the present disclosure, a methodcomprises forming isolation regions extending into a semiconductorsubstrate; forming a first plurality of semiconductor fins protrudinghigher than top surfaces of the isolation regions; forming a first gatestack on the first plurality of semiconductor fins; forming a gatespacer on a sidewall of the first gate stack; recessing the firstplurality of semiconductor fins to form a first plurality of recesses ona side of the first gate stack, wherein the first plurality of recessesextend to a level lower than top surfaces of the isolation regions; andperforming first epitaxy processes to grow a first epitaxy region,wherein the first epitaxy region fills the first plurality of recesses.In an embodiment, the device further comprises forming fin spacers onopposing sides of the first plurality of semiconductor fins, wherein thefirst epitaxy region comprises a first epitaxy layer, a second epitaxylayer over the first epitaxy layer, and a third epitaxy layer over thesecond epitaxy layer, wherein a top surface of the first epitaxy layerhas a lowest point, and the lowest point is lower than top ends of thefin spacers. In an embodiment, portions of the second epitaxy layergrown from neighboring ones of the first plurality of recesses aremerged. In an embodiment, the first epitaxy region is of n-type, and hasa wavy top surface, and the method further comprises forming a secondplurality of semiconductor fins protruding higher than the top surfacesof the isolation regions; forming a second gate stack on the secondplurality of semiconductor fins; recessing the second plurality ofsemiconductor fins to form a second plurality of recesses, wherein thesecond plurality of recesses extend to an additional level lower thanthe top surfaces of the isolation regions; and performing second epitaxyprocesses to grow a second epitaxy region, wherein the second epitaxyregion fills the second plurality of recesses, and the second epitaxyregion is of p-type, and has a cone shape. In an embodiment, the firstepitaxy processes comprise a first epitaxy process to grow a firstepitaxy layer in one of the first plurality of recesses, wherein thefirst epitaxy layer has a first dopant concentration; a second epitaxyprocess to grow a second epitaxy layer over the first epitaxy layer,wherein the second epitaxy layer has a second dopant concentrationhigher than the first dopant concentration; and a third epitaxy processto grow a third epitaxy layer over the second epitaxy layer. In anembodiment, the second epitaxy layer is an embedded stressor comprising:a top portion higher than top surfaces of the first plurality ofsemiconductor fins, wherein the top portion has a first sidewallcontacting a second sidewall of the gate spacer, and the sidewall has abottom end level with the top surfaces of the first plurality ofsemiconductor fins; and a bottom portion lower than the top surfaces ofthe first plurality of semiconductor fins. In an embodiment, the devicefurther comprises, after the first epitaxy process, performing anetching process on the first epitaxy layer. In an embodiment, theetching process is performed using a process gas comprising an etchinggas and silane.

In accordance with some embodiments of the present disclosure, a devicecomprises a semiconductor substrate; isolation regions extending intothe semiconductor substrate; a semiconductor fin between the isolationregions, wherein the semiconductor fin protrudes higher than topsurfaces of the isolation regions; a gate stack on a top surface andsidewalls of the semiconductor fin; and an epitaxy source/drain regionon a side of the semiconductor fin, wherein the epitaxy source/drainregion extends to a level lower than top surfaces of the isolationregions. In an embodiment, the epitaxy source/drain region comprises afirst semiconductor layer having a first dopant concentration; and anembedded stressor over and contacting the first semiconductor layer,wherein the embedded stressor has a second dopant concentration higherthan the first dopant concentration, and wherein the embedded stressorhas an upper portion higher than the top surface of the semiconductorfin, and a lower portion lower than the top surface of the semiconductorfin. In an embodiment, the embedded stressor comprises siliconphosphorous, and the device further comprises a capping layer over theembedded stressor, and wherein the capping layer comprises silicon,germanium, and phosphorous. In an embodiment, the device furthercomprises a first fin spacer and a second fin spacer on opposing sidesof the semiconductor fin, wherein the first semiconductor layer has anadditional top surface, and a lowest point of the additional top surfaceis level with or lower than top ends of the first fin spacer and thesecond fin spacer. In an embodiment, the lowest point of the additionaltop surface of the first semiconductor layer is level with the top endsof the first fin spacer and the second fin spacer. In an embodiment, thelowest point of the additional top surface is lower than the top ends ofthe first fin spacer and the second fin spacer. In an embodiment, thedevice further comprises a source/drain silicide region over andcontacting the epitaxy source/drain region, wherein the source/drainsilicide region has a V-shape in a cross-sectional view of the epitaxysource/drain region. In an embodiment, the epitaxy source/drain regionhas a wavy top surface, and the epitaxy source/drain region is ofn-type, and the device further comprises additional isolation regionsextending into the semiconductor substrate; an additional semiconductorfin protruding higher than top surfaces of the additional isolationregions; an additional gate stack on a top surface and sidewalls of theadditional semiconductor fin; and an additional epitaxy source/drainregion on a side of the additional semiconductor fin, wherein theadditional epitaxy source/drain region extends to a level lower than topsurfaces of the additional isolation regions, and a top portion of theadditional epitaxy source/drain region has a cone shape, and wherein theadditional epitaxy source/drain region is of p-type.

In accordance with some embodiments of the present disclosure, a devicecomprises a semiconductor fin; isolation regions on opposing sides ofthe semiconductor fin, wherein the semiconductor fin protrudes higherthan top surfaces of the isolation regions; a gate stack on thesemiconductor fin; and an epitaxy semiconductor region on a side of thesemiconductor fin, wherein the epitaxy semiconductor region extends to alevel lower than top surfaces of the isolation regions, and wherein theepitaxy semiconductor region comprises an embedded stressor, and theembedded stressor comprises a V-shaped bottom surface, wherein a top endof the V-shaped bottom surface is at a same level as a top surface ofthe semiconductor fin; and a V-shaped top surface, wherein a firstportion of the V-shaped top surface is higher than the top surface ofthe semiconductor fin, and a second portion of the V-shaped top surfaceis lower than the top surface of the semiconductor fin. In anembodiment, the device further comprises a semiconductor layerunderlying the embedded stressor, wherein the semiconductor layercomprises a facet on a (111) surface plane of the semiconductor layer.In an embodiment, wherein the facet on the (111) surface plane extendsto join a top corner of the semiconductor fin. In an embodiment, thedevice further comprises fin spacers on opposing sides of a portion ofthe embedded stressor, wherein the embedded stressor has a bottommostpoint higher than a top end of one of the fin spacers.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A method comprising: forming isolation regionsextending into a semiconductor substrate; forming a first plurality ofsemiconductor fins protruding higher than top surfaces of the isolationregions; forming a first gate stack on the first plurality ofsemiconductor fins; forming a gate spacer on a sidewall of the firstgate stack; recessing the first plurality of semiconductor fins to forma first plurality of recesses on a side of the first gate stack, whereinthe first plurality of recesses extend to a level lower than topsurfaces of the isolation regions; performing first epitaxy processes togrow a first epitaxy region, wherein the first epitaxy region fills thefirst plurality of recesses; and forming fin spacers on opposing sidesof the first plurality of semiconductor fins, wherein the first epitaxyregion comprises a first epitaxy layer, a second epitaxy layer over thefirst epitaxy layer, and a third epitaxy layer over the second epitaxylayer, and wherein a top surface of the first epitaxy layer has a lowestpoint, and the lowest point is lower than top ends of the fin spacers.2. The method of claim 1, wherein portions of the second epitaxy layergrown from neighboring ones of the first plurality of recesses aremerged.
 3. The method of claim 1, wherein the first epitaxy region is ofn-type, and has a wavy top surface, and the method further comprises:forming a second plurality of semiconductor fins protruding higher thanthe top surfaces of the isolation regions; forming a second gate stackon the second plurality of semiconductor fins; recessing the secondplurality of semiconductor fins to form a second plurality of recesses,wherein the second plurality of recesses extend to an additional levellower than the top surfaces of the isolation regions; and performingsecond epitaxy processes to grow a second epitaxy region, wherein thesecond epitaxy region fills the second plurality of recesses, and thesecond epitaxy region is of p-type, and has a cone shape.
 4. The methodof claim 1, wherein the first epitaxy processes comprise: an additionalfirst epitaxy process to grow the first epitaxy layer in one of thefirst plurality of recesses, wherein the first epitaxy layer has a firstdopant concentration; an additional second epitaxy process to grow thesecond epitaxy layer over the first epitaxy layer, wherein the secondepitaxy layer has a second dopant concentration higher than the firstdopant concentration; and a third epitaxy process to grow the thirdepitaxy layer over the second epitaxy layer.
 5. The method of claim 4,wherein the second epitaxy layer is an embedded stressor comprising: atop portion higher than top surfaces of the first plurality ofsemiconductor fins, wherein the top portion has a first sidewallcontacting a second sidewall of the gate spacer, and the sidewall has abottom end level with the top surfaces of the first plurality ofsemiconductor fins; and a bottom portion lower than the top surfaces ofthe first plurality of semiconductor fins.
 6. The method of claim 4further comprising, after the additional first epitaxy process,performing an etching process on the first epitaxy layer.
 7. The methodof claim 6, wherein the etching process is performed using a process gascomprising an etching gas and silane.
 8. A method comprising: formingisolation regions extending into a semiconductor substrate; forming asemiconductor fin between the isolation regions, wherein thesemiconductor fin protrudes higher than top surfaces of the isolationregions; forming a gate stack on a top surface and sidewalls of thesemiconductor fin; and forming an epitaxy source/drain region on a sideof the semiconductor fin, wherein the epitaxy source/drain regionextends to a level lower than top surfaces of the isolation regions, andwherein the forming the epitaxy source/drain region comprises:depositing a first semiconductor layer having a first dopantconcentration; and depositing an embedded stressor over and contactingthe first semiconductor layer, wherein the embedded stressor has asecond dopant concentration higher than the first dopant concentration,and wherein the embedded stressor has an upper portion higher than thetop surface of the semiconductor fin, and a lower portion lower than thetop surface of the semiconductor fin.
 9. The method of claim 8, whereinthe depositing the embedded stressor comprises deposing siliconphosphorous, and the method further comprises forming a capping layerover the embedded stressor, and wherein the capping layer comprisessilicon, germanium, and phosphorous.
 10. The method of claim 8 furthercomprising: before the epitaxy source/drain region is formed, forming afirst fin spacer and a second fin spacer, wherein the epitaxysource/drain region comprises a portion between the first fin spacer andthe second fin spacer, wherein the first semiconductor layer has anadditional top surface, and a lowest point of the additional top surfaceis level with or lower than top ends of the first fin spacer and thesecond fin spacer.
 11. The method of claim 10, wherein the lowest pointof the additional top surface of the first semiconductor layer is levelwith the top ends of the first fin spacer and the second fin spacer. 12.The method of claim 10, wherein the lowest point of the additional topsurface is lower than the top ends of the first fin spacer and thesecond fin spacer.
 13. The method of claim 8 further comprising forminga source/drain silicide region over and contacting the epitaxysource/drain region, wherein the source/drain silicide region has aV-shape in a cross-sectional view of the epitaxy source/drain region.14. The method of claim 8, wherein the epitaxy source/drain region isformed as having a wavy top surface, and the epitaxy source/drain regionis of n-type, and the method further comprises: forming additionalisolation regions extending into the semiconductor substrate; forming anadditional semiconductor fin protruding higher than top surfaces of theadditional isolation regions; forming an additional gate stack on a topsurface and sidewalls of the additional semiconductor fin; and formingan additional epitaxy source/drain region on a side of the additionalsemiconductor fin, wherein the additional epitaxy source/drain regionextends to a level lower than top surfaces of the additional isolationregions, and a top portion of the additional epitaxy source/drain regionhas a cone shape, and wherein the additional epitaxy source/drain regionis of p-type.
 15. A method comprising: forming isolation regions onopposing sides of a semiconductor fin, wherein the semiconductor finprotrudes higher than top surfaces of the isolation regions; forming agate stack on the semiconductor fin; and performing epitaxy processes toform an epitaxy semiconductor region on a side of the semiconductor fin,wherein the epitaxy semiconductor region extends to a level lower thantop surfaces of the isolation regions, and wherein the epitaxysemiconductor region comprises an embedded stressor, and the embeddedstressor comprises: a V-shaped bottom surface, wherein a top end of theV-shaped bottom surface is at a same level as a top surface of thesemiconductor fin; and a V-shaped top surface, wherein a first portionof the V-shaped top surface is higher than the top surface of thesemiconductor fin, and a second portion of the V-shaped top surface islower than the top surface of the semiconductor fin.
 16. The method ofclaim 15, wherein the embedded stressor is formed over a semiconductorlayer, and wherein the semiconductor layer comprises a facet on a (111)surface plane of the semiconductor layer.
 17. The method of claim 15,wherein the facet on the (111) surface plane extends to join a topcorner of the semiconductor fin.
 18. The method of claim 17 furthercomprising, before the epitaxy processes, forming fin spacers onopposing sides of a portion of the embedded stressor, wherein theembedded stressor has a bottommost point higher than a top end of one ofthe fin spacers.
 19. The method of claim 1, wherein the first epitaxyprocesses are n-type regions.
 20. The method of claim 15, wherein theepitaxy semiconductor region is an n-type region.